Jiyoon Cho, Jaewoo Lee, Alex Taekyung Lee, Yeongjae Kim, Dongwoo Kang, Joohyun Kim, Erwin Jongwoo Park, Juri Lee, Kang Kim, Muho Jung, Taeghwan Hyeon, Changha Lee
Journal: ACS nano 2025;19(33):30137-30150
PMID: 40795282
Cupryl species (Cu(III)) are promising oxidants for degrading recalcitrant organic contaminants and harmful microorganisms in water. In this study, defect-rich cuprous oxide (D-CuO) nanospheres (NSs) are introduced as a Fenton-like catalyst to generate Cu(III) for the inactivation of antibiotic-resistant bacteria (ARB) and antibiotic resistance genes (ARGs). D-CuO, in the presence of HO, achieved inactivation efficiencies 3.2, 3.0, and 2.4 times higher than those of control CuO for ARB, extracellular ARGs (e-ARGs), and intracellular ARGs (i-ARGs), respectively. Experimental evidence from oxidant scavenging tests, Cu(III)-periodate complexation assays, electron paramagnetic resonance (EPR), and in situ Raman spectroscopy confirmed that D-CuO significantly enhanced Cu(III) generation when reacting with HO compared to control CuO. Density functional theory (DFT) calculations further revealed that unsaturated copper atoms in D-CuO enhance HO adsorption by improving the structural accessibility of adjacent oxygen atoms. This facilitates electron transfer processes and promotes subsequent Cu(III) generation. The D-CuO/HO system demonstrated excellent reusability, maintaining a 4-log reduction of ARB over five cycles, and proved effective across various water matrices and microbial species. These findings highlight the potential of the D-CuO/HO system, driven by defect engineering, as a robust platform for enhancing water safety and advancing sustainable disinfection technologies.
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